Low-cost nanostructured mold replication
Soft lithography at nanoscale requires a nanostructured silicon or resist master mold generated by advanced and expensive lithography and complex transfer techniques like ion etching. Such a fabrication is prohibitive for the industrial use of polydimethylsiloxane (PDMS) stamps in soft lithography. Our work focuses on a straightforward – low cost – technology to duplicate silicon master molds with nanoscale structures. Hence, master silicon molds patterned with nanometer scale lines can be replicated into epoxy resist and polyurethane by the following process.
Principle of the duplication method
The PDMS stamp made from a silicon master mold is used as template to copy this original mold into epoxy resist or polyurethane by UV nanoimprint lithography and demonstrated a faithful replication of the silicon mold nanostructures.Moreover, the biomolecule gratings patterns obtained by µCP using the PDMS stamps molded on epoxy resist or polyurethane replicated molds are identical to those obtained with the original silicon master mold.
Epoxy resist or polyurethane are very attractive and cost-effective substrates to reproduce at large scale PDMS stamps initially made on a nanostructured silicon master mold.
- Amandine M.C. Egea and Christophe Vieu, Microcontact printing of biomolecular gratings from SU-8 masters duplicated by Thermal Soft UV NIL, Microelectronic Engineering, 2011, V.88, p.1935-1938.
- Julie Foncy, Jean-Christophe Cau, Carlos Bartual-Murguia Jean Marie François, Emmanuelle Trévisiol and Childérick Sévérac, Comparison of polyurethane and epoxy resist master mold for nanoscale soft lithography, Microelectronic Engineering, 2013, V.100, p.183-187